@ShahidNShah
February 23 to February 27, 2020
San Jose Convention Center, San Jose, California, United States
As the leading global lithography event, the technical program will focus on works in optical lithography, metrology, and EUV.Leaders come to solve challenges in lithography, patterning technologies, and unique materials, while sharing the latest advancements in the semiconductor industry.
Lithography continues to be challenged to extend into ever-shrinking generations, yet remain manufacturable and cost effective. State-of-the-art processes continue with immersion lithography and multiple patterning, while EUV lithography moves closer toward production readiness.At the same time, the lithography community aggressively pursues alternative patterning approaches and complementary solutions.
Continue reading at spie.org
February 24 to February 28, 2020
Snake River Lodge, Teton Village, Wyoming
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